you are developing new coatings and substrates – you need the
nkd to provide you with the most spectrocopic information available
from a thin film analysis system.
you have more than one type of thin film measurement to make, multiple
applications and analysis of complex structures, new and absorbing
films, then you need the nkd - specifically designed for the most
demanding applications. It provides:
– Space for larger samples
– Variable angle measurements
– Flexibility of measurement
T & R simultaneously.
layer thickness for single and multilayers with ease.
optical properties and absorption for all types of materials -
transparent, absorbing, dielectric, polymers, semiconductors, organic
semiconductors and polymers etc.
advantage of advanced features such as a the heated stage, sample
mapping and small spot sizes.
application capabilities of the nkd include :
• Thick and thin layers
• High and low index (n) layers
• Plastics & polymers
• Optical coatings
• Display technology
• Organic and Inorganic semiconductors
• Metal films
• Dielectric films
• DBR structures
notes for the nkd.
Optical Metrology for QC & production type
applications of the nkd.